JPH0644008Y2 - ガスフェーズ型集束イオンビーム装置 - Google Patents
ガスフェーズ型集束イオンビーム装置Info
- Publication number
- JPH0644008Y2 JPH0644008Y2 JP4612589U JP4612589U JPH0644008Y2 JP H0644008 Y2 JPH0644008 Y2 JP H0644008Y2 JP 4612589 U JP4612589 U JP 4612589U JP 4612589 U JP4612589 U JP 4612589U JP H0644008 Y2 JPH0644008 Y2 JP H0644008Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- ion beam
- emitter
- gas phase
- focused ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010884 ion-beam technique Methods 0.000 title claims description 35
- 238000000605 extraction Methods 0.000 claims description 7
- 239000007789 gas Substances 0.000 description 52
- 239000001307 helium Substances 0.000 description 6
- 229910052734 helium Inorganic materials 0.000 description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 6
- 230000001960 triggered effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910001338 liquidmetal Inorganic materials 0.000 description 2
- NMFHJNAPXOMSRX-PUPDPRJKSA-N [(1r)-3-(3,4-dimethoxyphenyl)-1-[3-(2-morpholin-4-ylethoxy)phenyl]propyl] (2s)-1-[(2s)-2-(3,4,5-trimethoxyphenyl)butanoyl]piperidine-2-carboxylate Chemical compound C([C@@H](OC(=O)[C@@H]1CCCCN1C(=O)[C@@H](CC)C=1C=C(OC)C(OC)=C(OC)C=1)C=1C=C(OCCN2CCOCC2)C=CC=1)CC1=CC=C(OC)C(OC)=C1 NMFHJNAPXOMSRX-PUPDPRJKSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4612589U JPH0644008Y2 (ja) | 1989-04-19 | 1989-04-19 | ガスフェーズ型集束イオンビーム装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4612589U JPH0644008Y2 (ja) | 1989-04-19 | 1989-04-19 | ガスフェーズ型集束イオンビーム装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02137747U JPH02137747U (en]) | 1990-11-16 |
| JPH0644008Y2 true JPH0644008Y2 (ja) | 1994-11-14 |
Family
ID=31560927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4612589U Expired - Fee Related JPH0644008Y2 (ja) | 1989-04-19 | 1989-04-19 | ガスフェーズ型集束イオンビーム装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0644008Y2 (en]) |
-
1989
- 1989-04-19 JP JP4612589U patent/JPH0644008Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02137747U (en]) | 1990-11-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |